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A 21st Century Approach to Airborne Molecular Contamination Control By Jitze Stienstra Ph.D., Joseph Wildgoose, Jürgen Lobert Ph. D., Christopher Vroman, David Ruede
March/April 2010
AMC control in the fab requires not just the knowledge of which contaminants can be harmful, but requires a high level of competency in several disciplines for the careful selection and implementation of products to result in a total solution.
Abstract
The ability to control Airborne Molecular Contaminants (AMC) and their interactions with semiconductor fabrication processes and equipment requires a new, comprehensive approach. Multiple disciplines and competencies are required to bring a systematic understanding to both the challenges and potential solutions. Four steps that comprise the essential elements needed in a multistep, multilevel, integrated approach to data-driven and cost-effective 21st century AMC control are explored in this article.
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